Used CANON FPA 2500 i2 #9298434 for sale

CANON FPA 2500 i2 is a high-performance wafer stepper designed for advanced semiconductor production. This machine helps to produce devices with finer line widths, higher yields, and pressure-sensitive output. The proprietary technologies behind this equipment are based on CANON tried-and-true iTRACT (Image Transfer, Registration, and Control Technology), and it provides users with outstanding patterning accuracy and repeatability. CANON FPA-2500I2 features a wide range of exposure modes, including conventional full-field stepper, repetitive scan (RS) stepper, and wide-field scan (WFS) stepper. The RS mode of this system allows users to work with both exposed and unexposed areas of a wafer, aiding in the production of complex device structures. The WFS mode of this unit provides flexibility when dealing with a variety of overlay stages, significantly improving throughput in comparison to conventional stepper systems. FPA-2500 I2 is also equipped with the Peel Exposure Mode (PEM), which allows users to control the overlay of multiple layers with high precision. This machine boasts a 2.5 x 2.5 µm imaging_field_area and the user can adjust the beam size with respect to each PE mode layer. CANON FPA-2500 I2 also provides users with the ability to adjust exposure time and light intensity. The versatility and performance of CANON FPA-2500 I 2 make it ideally suited for advanced circuit fabrication. This tool provides users with excellent stepper accuracy, allowing them to work with challenging structures and reduce costs associated with mask fabrication. The asset also provides users with a wide range of exposure modes, enabling them to work quickly and efficiently. With its robust operation, FPA-2500I2 is an excellent tool for the production of semiconductor devices.