Used CANON FPA 2500 i2 #9314257 for sale

CANON FPA 2500 i2 is a wafer stepper used in the fabrication of semiconductor devices. The next-generation model of CANON previous stepper, the FPA 2500i, CANON FPA-2500I2 is a step-and-repeat tool designed to draw patterns onto the silicon wafer surface. This tool can achieve up to sub-3-micron levels of resolution when working with 193-nm photomasks. The machine is equipped with two advanced optical lenses, the Elect La Rival Multi Dynamic Focus Aiming equipment and the Maximum Efficiency Catadioptric (ME2) lens. The La Rival system is designed to provide superior overlay accuracy and is able to maintain its accuracy over the entire exposure range rather than just one area, making it possible to use a wide range of lenses for larger reticles. The ME2 lens is a powerful device that offers a mix of reduced aberration, improved resolution, and lower sensitivity to vibrations than even the previous series of lenses. FPA-2500 I2 is also integrated with innovative and highly reliable lithography features. These include a high-speed defocus detection unit based on CANON proprietary technique known as "depth monitoring," a specification-accurate focus machine that assists in the wafer lithography process, and a high-accuracy stage positioning device designed to ensure ultra-precise lithography alignment. CANON FPA 2500 I 2 can also provide superb uniformity over the entire exposure field. This is enabled by CANON new "i-Uniformity" technology which monitors the process step-by-step to provide highly repeatable, high-precision imaging. Additionally, CANON FPA-2500 I2 eliminates the need for calibration between lots, making it a more reliable, efficient tool and ensuring higher yields. FPA-2500 I 2 is also designed to reduce cycle times by offering cleanliness improvements and multiple deposition options. All these features and advantages make FPA 2500 I 2 an outstanding tool for the challenging task of producing semiconductor devices.