Used CANON FPA 2500 i2 #9394905 for sale

CANON FPA 2500 i2 Wafer Stepper is a highly advanced semiconductor lithography machine. It boasts a vibrant range of features and capabilities well-suited to modern applications in the semiconductor industry. At its core, CANON FPA-2500I2 is powered by a photon source that can output a maximum of 250 mW of 193nm light. This produces a projection area of up to 6.5mm x 6.5mm for exposure levels up to 4.3 μm, allowing for accurate imaging of features such as contact holes and line/space geometries. The device incorporates CANON proprietary EDS - Electron Displacement Stability - feature. This allows for precise control of illumination and focus conditions during exposure, dramatically increasing the accuracy and quality of the lithography results. FPA-2500 I2 is specifically designed to handle demanding applications such as production of fine-pitch memory chips. This stepper can reproduce images over a wide range of features down to a 28 nm resolution, along with production areas up to 710 x 710 mm. Not only that, but FPA 2500 i2 can perform two-way focus control and Advanced Line Width Control, making it ideal for producing semiconductor devices with high precision and excellent results. FPA 2500 I 2 also includes several advanced features for user convenience. A modular design offers effortless setup and repair, while built-in maintenance mounters ensure high-precision accuracy. Furthermore, the device features a built-in functions for automatic alignment, reduction of line width variations, and high-level acceleration. In brief, CANON FPA 2500 I 2 Wafer Stepper is a powerful lithography device, offering excellent user control, robust physics-based features, and precision results. It is ideal for a wide range of demanding semiconductor applications, enabling users to craft high-quality, fine-pitch memory chips with minimal effort.