Used CANON FPA 2500 i3 #293646546 for sale
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CANON FPA 2500 i3 Wafer Stepper is an advanced lithography tool designed for patterning precision features on semiconductor wafers. It is equipped with sophisticated optics and precision scanning stages for achieving high resolution imaging and tight geometric accuracy. CANON FPA-2500I3 utilizes a 248-nm krypton fluoride excimer laser (KrF) source to generate a light beam that can be shaped and directed to the desired substrate area through high-performance optics. The stepper offers a variable numerical aperture (NA) capability ranging from 0.30 to 0.50, enabling sub-micron resolution imaging with a range of different patterning applications. FPA-2500 I3 features a dual-lane transport system for maximum throughput and accuracy. Paired with the advanced wafer alignment system, CANON FPA-2500 I 3 guarantees accurate positioning of the wafer for high-precision patterning. It is also equipped with advanced image processing and advanced vector-based patterning capabilities, making it suitable for wafer inspection, joint cutting, and high-precision fiber pattern writing applications. The stepper is also designed with mechanical reproducibility in mind, and is capable of consistently patterning critical features with a high degree of accuracy. Furthermore, it is designed to offer long-term reliability, as well as easy maintenance and operation. With its flexible design, CANON FPA 2500 I 3 is able to support various sophisticated applications, including IC packaging, Micro-electromechanical systems (MEMS), and technical ceramics applications. It is the perfect choice for photomask and wafer lithography for high-volume production.
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