Used CANON FPA 2500 i3 #293762557 for sale

CANON FPA 2500 i3 is a state-of-the-art wafer stepper designed for patterning of large-diameter photomasks for application in integrated circuit lithography. With its industry-leading mask size of up to 1500 mm and an exceptional line-width resolution of 0.75 µm, CANON FPA-2500I3 offers unparalleled imaging accuracy and high throughput. FPA-2500 I3 employs advanced imaging and illumination systems. A two-stage, coherent illumination equipment which includes a pin-hole array assures superior uniformity of the imaging field and eliminates effects of disturbing elements such as line stops and lens aberrations. The system employs a high-accuracy hexapod to precisely control the position of the illumination field in relation to the mask substrate for maximum accuracy. CANON FPA-2500 I 3 also features precise stage control with the highest available accuracy. It uses a monolithic, ultra-smooth one-piece mechanical construction with advanced pre-compensation mechanisms to attain high-precision positional repeatability and longitudinal accuracy, which reduces unit aberrations to a minimum. This enables FPA 2500 i3 to guarantee superb printing accuracy. Furthermore, FPA-2500I3 also offers a powerful set of maintenance and operation features that makes day-to-day operation easier and more efficient. Its advanced Focus Monitor Machine uses optical sensors and analysis algorithms to track and monitor camera parameters such as focus depth, contrast, and line width precisely, so that imaging and patterning processes are done quickly and accurately. Overall, FPA 2500 I 3 is a powerful and accurate wafer stepper designed for fast and accurate patterning of large-diameter photomasks used for integrated circuit lithography. Its one-piece monolithic construction, advanced illumination, imaging, and stage control systems, and monitoring features make it an essential tool in any digital semiconductor fabrication laboratory.