Used CANON FPA 2500 i3 #9229104 for sale

CANON FPA 2500 i3 is a high-accuracy wafer stepper used in microfabrication processes. It is a stepper that can image smaller and faster than traditional scanning based electron beam systems. CANON FPA-2500I3 is capable of pre-aligned exposures with precision alignment of 200 nanometers. The equipment features a 0.48 NA illumination system and 151 mm long working distance. The full field of view is 100 mm with a full format of 2576 mm square. FPA-2500 I3 is capable of achieving a 35mm through-the-lens resolution with its semi-active alignment capabilities. The stepper itself is a multi-field wafer stepper with a fully automatic alignment unit. Using a combination of the illumination and the optical machine, the stepper is designed to deliver extremely accurate alignment across the entire field. It has two refractive imaging modes, which are NAI (normal area illumination) and EI (extended area illumination). The NAI mode is used for field resolution and EI mode is used to achieve high contrast in resolution. CANON FPA 2500 I 3 stepper features an advanced automation tool as well as a large environment chamber. This allows for ability to be completely stable in weight, even after long periods of time in operation. The automation asset allows for accuracy and repeatability, which allows for the stepper to maintain its accuracy on multiple stamps. FPA 2500 i3 has a wide range of exposure times which allow for a wide range of process control. It also offers a range of scanning modes, such as multi-level exposure, simultaneous exposure and stepped exposure. This allows for compatibility with various substrate materials. In terms of imaging accuracy, FPA-2500I3 is capable of 60 nanometer feature registration accuracy. In order to further maintain image accuracy, the stepper is equipped with a two micron rule, plus an area-based autofocus correction. This ensures increased exposure accuracy and stability in alignment accuracy. The stepper is also equipped with a high exposure monitor model. This equipment enables users to measure and monitor the exposure time data and also make use of process winholes. This monitoring system also allows for customizable and expandable column control. This allows for greater control of job execution. Overall, FPA 2500 I 3 is an advanced wafer stepper designed for extremely precise microfabrication processes. It has a wide range of automation capabilities and is built for highly accurate imaging. It is well equipped with features that ensure accurate imaging as well as expand ability and process control.