Used CANON FPA 3000 EX4 #136890 for sale

CANON FPA 3000 EX4 is a full-field projection aligner (FFPA) that provides precise and accurate alignment of a variety of photomasks and substrates. This wafer stepper is an essential tool for high-precision photomask and substrate fabrication processes. The equipment has an impressive array of features which make it an invaluable tool for a wide range of applications in photomask, wafer and Optical/MEMS fabrication. The main advantage of CANON FPA-3000EX4 is its ability to accurately align photomasks and substrates to nanometer accuracy. It is equipped with a two-dimensional, non-contact image-sensing system, which ensures uniform illumination and precise and accurate alignment of the photomask and substrate. This precise alignment allows for precise alignment of features such as circuit patterns, lines and edges. FPA-3000 EX4 has a high level of accuracy, repeatability and throughput. The unit uses wafer-level leading-edge imaging technology to increase the accuracy and stability of the alignment process. This machine also offers very high-resolution alignment accuracy with accurate compensations for changes in exposure conditions, setting and sample size. FPA-3000EX4 also comes with a fully automated motion control tool that can accurately position the photomask and substrate during alignment. The advanced motion control asset also ensures high-precision alignment by accurately controlling the speed and direction of the move. The automated model is also configured to provide accurate alignment compensation, allowing for higher process accuracy. CANON FPA-3000 EX4 also comes with a wide range of power and decoder control options that allow the user to customize exposure settings and parameters. The equipment also comes with user-friendly software that has a wide range of graphical user interfaces (GUIs) to make operation and control easier. The system also offers a wide range of features that make it an ideal tool for the fabrication of advanced photomasks and substrates. The unit has an integrated exposure machine that provides precise and controlled exposure of the wafer for a variety of exposure applications. The tool also offers automatic data calculation and storage, allowing for more efficient fabrication processes. The asset also has a wide range of optional accessories that enable the user to customize the model to their exact needs. Options include accessories such as monitor systems and precision pattern tuning hardware, as well as automatic cleaning hardware, enabling the user to create a equipment customized to their exact requirements. FPA 3000 EX4 is a powerful and versatile tool for the fabrication of high-precision photomasks and substrates. The system's highly accurate alignment, combined with its wide range of features, make it an invaluable tool for a variety of photomask, wafer and Optical/MEMS fabrication processes.