Used CANON FPA 3000 EX4 #9359426 for sale

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Manufacturer
CANON
Model
FPA 3000 EX4
ID: 9359426
Stepper, 8" Reticle handling system, 8" ZYGO 7701C/E Laser head CYMER ELS-5300 Laser Panels included Accessories: Lens unit Control rack Board and power supply 1998 vintage.
CANON FPA 3000 EX4 is a high-end wafer stepper designed for precision lithography. It is capable of producing ultra-small feature sizes on wafers due to its sub micrometer accuracy. It is equipped with an advanced 4-chamber optical element and several aligners and metrology devices for quick alignment and fine operation. The device is also integrated with a high-speed multi-axis equipment that enables long-term stable operation. The main body of the device is made of durable materials such as aluminum and reinforced plastic for long-term use and maximum reliability. Its large LCD touch screen allows users to monitor and control the device with ease. This wafer stepper is equipped with a robotics system that allows automatic handling of multiple wafers. CANON FPA-3000EX4 also comes with an integrated cooling unit to help protect sensitive optical elements from heated chips. This cooling machine includes an array of heat-absorbing fan units, thermoelectric shutters, and a set of radiators. It also features a laser interferometry tool which can detect and measure the changes in the surface angles of the lenses. This ensures the accuracy of the lithography process for better alignment and imaging. The stepper has the capability to perform several processing steps in one wafer exposure cycle. This includes the application of resist, exposure, wafer hardening, and peeling off the exposed pattern. It has a beam scan synchronization control and selectable exposure time settings to further optimize the patterning process. FPA-3000 EX4 is capable of producing microscopic components for advanced regional structures such as thin films, advanced patterning, and high-resolution patterns on smaller substrates. Additionally, this wafer stepper offers dynamic performance, higher throughput, higher accuracy, and cost reduction benefits for both research and device production-related applications.
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