Used CANON FPA 3000 i4 #293604649 for sale

Manufacturer
CANON
Model
FPA 3000 i4
ID: 293604649
Wafer Size: 6"
Vintage: 1995
i-Line stepper, 6" Absolute distortion NA 63 sigma 65: DX: ≤0.050 µm DY: ≤0.050 µm Focus range: <0.25 µm Mag range: <2 ppm Resolution: L/S: 0.35 µm Depth of focus: 0.35µm L/S and 0.5µm ISO: ≥0.8 µm Image field deviation: 0.35µm L/S and 0.5µm ISO: ≤0.5 Missing lots parts 1995 vintage.
CANON FPA 3000 i4 is a wafer stepper, a type of photolithography equipment used in semiconductor fabrication. This stepper utilizes a powerful syncroscan system and a unique 4-beam light source, providing superior imaging performance for mass production. This unit features high throughput, excellent overlay accuracy and many other advanced features. CANON FPA-3000I4 stepper is equipped with a 4-beam projection lens and a synchronous scan mirror scanner. The machine is powered by a 0.5 NA lens and provides superior uniformity, small spot sizes, and high contrast ratio. This allows for printing small shapes that are difficult to achieve with single-beam systems. It employs advanced optics and algorithms, which enable faster scanning and imaging speeds. The tool also features a high-precision X-Y stage for accurate positioning and traceability. The stage is supported by robust control algorithms and ensures fast and precise movements. It is capable of moving up to 3000 nm/s. Additionally, it has a resolution of 0.02nm, enabling smaller feature sizes and higher precision than ever before. FPA 3000I4 also employs micro-bump alignment technology, allowing for smooth substrate placement and quick alignment optimization. The asset can be configured to accommodate wafers up to 8 inches in size and has the capability to handle up to 16 wafers per hour. The model is accompanied by a software package that provides an intuitive UI with intuitive workspace controls. Overall, FPA 3000 I 4 is a very advanced wafer stepper designed with mass production in mind. It offers excellent imaging performance and throughput, combined with accurate alignment and traceability. This equipment is ideal for production facilities looking for a reliable and efficient lithography solution.
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