Used CANON FPA 3000 i4 #9121236 for sale
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ID: 9121236
Wafer Size: 8"
Vintage: 1995
i-Line stepper, 8"
Reticle: 6"
I/F: Mark-8
1995 vintage.
CANON FPA 3000 i4 is a precision wafer stepper that is equipped with a range of features to allow for high-precision, high-throughput production. This device is engineered for the generation of advanced 3D ICs, micro-machining, optical components and other high-precision applications. CANON FPA-3000I4 utilizes a high-performance i-line source, which is optimized to generate the best possible uniformity with options to select from 4, 6 and 8" wafers with a minimum chuck size of 150mm and a maximum of 450mm. FPA 3000I4 is designed with a patented Two-Step Hyperbolic Mirror System (TMMS) Technology, which allows for excellent, uniform illumination across the entire exposure field. This is enhanced by the micro lens array which is designed to restrict the exposure field to the size necessary while also improving depth of focus. This ensures maximum accuracy and reproducibility of exposure results. FPA-3000I4 also features a proprietary optics technology which reduces aberration and eliminates alignment problems. This includes a series of compound and symmetric lenses, a polarization beam splitter, a set of prisms, and an iris assembly. This allows the device to efficiently maintain the aberration within the optical path, and to precisely control the wavefront errors of the light. This ensures high accuracy exposure of the wafers during operation. FPA 3000 I 4 also features die-to-die exposure control, which optimizes exposure accuracy to provide a high-quality image of each device. The device utilizes an automated wafer-handling system which allows for through-the-lens wafer alignment and focus. In addition to this, the device also has a 150mm chuck diameter, with a load capacity of 4kg per chuck. This ensures that the device can handle a variety of industrial applications. CANON FPA-3000 I 4 comes equipped with a licensed software suite which allows users to use exposure calculations, composition and pattern generation as well as full data analysis. The device also features an on-board process monitor which allows for simple and meaningful exposure data analysis. In addition to this, the device is designed with safety systems to reduce the risk of damage to the system, and to ensure a smooth operation. CANON FPA 3000I4 is a top-of-the-line precision wafer stepper. With its array of features, it ensures the highest precision and throughput. This includes features such as a high-performance i-line source, TMMS Technology, micro lens array and proprietary optics technology to reduce aberration. Furthermore, it is also equipped with automated wafer-handling, a software suite and on-board process monitor for full data analysis. All of these features come together to ensure that users can achieve the highest quality results.
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