Used CANON FPA 3000 i4 #9121239 for sale
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ID: 9121239
Wafer Size: 8"
Vintage: 1995
i-Line stepper, 8"
Reticle: 6"
I/F: Mark-8
1995 vintage.
CANON FPA 3000 i4 is a state-of-the-art wafer stepper designed for advanced semiconductor fabrication. This equipment is capable of performing wafer alignment and imaging processes with micro-millimeter accuracy and produces extremely high-precision wafers with microscopically small features. This tool features a 4-chuck reticle stage for automatically loading and positioning of the reticles for imaging. The stepper can handle both standard and customized photomask patterns. Also included is a high-speed optical system for enhanced imaging capabilities, as well as a motorized lens unit for precise position control. The stepper supports multiple exposure types, including trenching, covering, and interrupted shots. It also features an intensified camera machine with multiple exposures for increased image resolution and contrast. Additionally, updated waveform generator and controller makes fine-tuning the pattern easier. CANON FPA-3000I4 is designed to efficiently minimize particle contamination within the stepper and to reduce the effects of ambient environment during imaging. This ensures maximum product quality. FPA 3000I4 also boasts advanced feature recognition software, which automatically compensates for differences in wafer shapes. This ensures ideal imaging alignment regardless of the wafer's curvature. The stepper is driven by a powerful CPU and equipped with high data bandwidth and a Gigabit Ethernet connection. This provides faster processing time and smoother data transfer during patterning operations. The tool is capable of patterning on 300 mm, 200 mm, and 125 mm wafers. This versatility allows for the production of wide range of devices and components that incorporate advanced designs. FPA 3000 I 4 has been proven to meet the most stringent industry standards and has been widely adopted and trusted by many leading manufacturers. It has become the go-to wafer stepper for advanced semiconductor fabrication, as it provides reliable, high-precision performance for years to come.
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