Used CANON FPA 3000 i4 #9224170 for sale

CANON FPA 3000 i4 is a next-generation wafer stepper equipment designed to offer advanced lithography capabilities for the most demanding application requirements. It is the only tool of its kind that is capable of achieving resolutions in the 0.2μm range, while still maintaining high throughput and productivity. The system is equipped with advanced illumination and focusing capability, as well as automated alignment and pattern recognition. The i4 stepper consists of a main unit, a reticle handling robot and an optical drive unit. The main unit contains the core of the lithography process, which includes the wafer stage, wafer motor, illumination unit, projection lens, and the photomask. The wafer stage provides automated handling for the wafer during lithography and can control the rocking, loading and unloading, stage positioning, and alignment. The wafer motor is used to drive the wafer stage over the field of view and provides an accurate, robust and repeatable movements for high-precision lithography. The illumination unit consists of a light source and imaging optics. The light source consists of a high-power ultraviolet or Argon Fluoride laser machine and a beam-forming optical tool that provides homogenous illumination and corrects for focal and intensity aberrations The imaging optical asset consists of a movable 1X objective lens, lenses for condensing and imaging the beam, and a multi-aperture and astigmatic beam-shaping unit. The projection lens is made up of a set of two sets of lenses. The first set of lenses is used to focus the imaging beam onto the reticle, while the second set is used to magnify the pattern onto the wafer. The lens is motorized and can be used to vary the focus and magnification of the pattern on different areas of the wafer. The photomask is a quartz substrate that is coated with a pattern of opaque and transparent layers that define the pattern that needs to be printed on the wafer. The reticle handling robot and optical drive model are responsible for transferring the photomask from the reticle stage to the optics drive equipment, which then moves the mask onto the projection lens for lithography. The system also features an automated alignment and pattern recognition unit, which accurately aligns the pattern to the reticle for each exposure before printing. CANON FPA-3000I4 is designed to offer high throughput and productivity with a 0.2μm resolution. The automated alignment and pattern recognition machine makes it ideal for high-resolution lithography, while the advanced illumination and focusing capabilities ensure consistent results. The tool is highly reliable and provides repeatable lithography results, making it an excellent choice for the most demanding applications.