Used CANON FPA 3000 i4 #9361809 for sale

CANON FPA 3000 i4 wafer stepper is a high-resolution, high-speed lithography equipment used in precision semiconductor production. It is designed to handle 4-inch and larger semiconductor wafers and has a maximum resolution of 0.25µm. It is also capable of efficiently exposing large-area reticles at high speed, making it ideal for high-volume production. The system is based on a pre-aligner stage that uses a scanning stepper to accurately move wafer. It can be configured with a choice of two lenses: a 0.6 NA lens or a 0.7 NA lens. This provides higher resolution and image quality, allowing mask makers to remain competitive in their respective fields. CANON FPA-3000I4 also has an auto-focus unit for precise and repeatable alignment. This feature ensures each mask is properly aligned and that the exposure process is consistently accurate. The auto-focus machine also helps to reduce downtime, as it quickly and efficiently sets up each mask before exposure. The stepper also includes an advanced imaging tool for improved contrast and high throughput. This asset includes an advanced Digital Image Processor which helps to maximize throughput by correcting vignetting and blurring and decreasing the overhead associated with correcting lens aberrations. It also has advanced noise reduction algorithms to reduce the amount of residual image noise. FPA 3000I4 also integrates into a variety of back-end processes, such as auto-cleaning and post-exposure baking. The stepper has two high-torque wafer spinners that automatically rotate wafers and provide precise and repeatable cleaning. The model also has a post-exposure baking station which allows for precise temperature and humidity control and ensures that feature sizes remain consistent across multiple runs. Finally, the stepper includes an advanced data collection and analysis equipment which can store and analyze the results from up to 25,000 wafers. This allows the system to monitor production trends, detect any anomalies or defects in a timely manner, and optimize process parameters and recipes for improved yield. Overall, CANON FPA-3000 I 4 is a reliable and productive wafer stepper that is designed to meet the most demanding semiconductor lithography and electronics production requirements. It is capable of producing feature sizes that go well below 0.25µm, making it a great choice for high-resolution imaging and high-volume production.