Used CANON FPA 3000 i5 #293615951 for sale

CANON FPA 3000 i5 is a wafer stepper designed for semiconductor production. It is capable of measuring and producing various types of components including chips and MEMS. The stepper incorporates a wide range of advanced technologies including i-line, krypton fluoride (KrF) excimer laser, and highly precise magnification stages. The device is capable of producing high-quality components with minimal defects, making it an ideal choice for high-volume production. CANON FPA 3000I5 is equipped with an i-line excimer laser to facilitate high-speed wafer cutting. This technology allows for fast and efficient exposure of up to 1500 wafers per hour. Furthermore, the use of a KrF excimer laser enables higher exposure results and smaller linewidths. The stepper also incorporates a high-accuracy magnification stage with a mechanism that increases exposure uniformity. This technology allows for accurate and reliable wafer level exposure. Aside from the high exposure capabilities, FPA-3000 I5 is equipped with an advanced Z-axis, that enables high-precision and accurate stepper performance. The device is also equipped with a wide range of automation capabilities for efficient and high-speed production. Moreover, it has Dynamic Autofocus (DAF) technology to ensure uniform integration of the components and improved throughput. This technology also enables fast exposure shot variability and reduced mask alignment times. Furthermore, CANON FPA-3000 I5 has a high-precision exposure controller that ensures stable and efficient process results. The device is equipped with advanced thermal management systems that regulate and monitor the environment of the wafer, keeping temperature and humidity levels stable. This technology helps maintain high processed wafer quality and prevents exposure errors. FPA 3000I5 is a reliable and highly efficient stepper, suitable for a wide range of component production. It has advanced capabilities and state of the art automation technologies that make it ideal for high-volume production and leveraging more efficient processes with optimal yields. Its high-precision exposure controller ensures stable and reliable performance while the advanced thermal management systems help maintain high-quality results.