Used CANON FPA 3000 i5+ #293815249 for sale
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CANON FPA 3000 i5+ is an advanced scan-stepper designed to provide high-end exposure systems for the production of maskless photolithography systems. It is designed to achieve exposure with unmatched accuracy, precision, and speed. CANON FPA 3000I5+ utilizes an optical equipment that utilizes a type of grating called a grid array exposure mask to provide a more accurate and uniform exposure on the stage. This grating is composed of an array of micro patterns that are periodically spaced, allowing for high-definition images to be projected accurately onto the exposure stage without blurring or distortion. The system utilizes two Interferometric Measuring Scanners (IMS), which help ensure the accuracy of the positioning of the mask that is being exposed to the exposure stage. This is especially important, because even the slightest error in position can lead to a major defect in the finished device being produced. Two scanning modes are available, which enables the unit to address different types of device-manufacturing requirements. FPA-3000 I5+ also employs advanced projection and maskless patterning technologies, such as a patented dielectric film mask patterning machine, which greatly increases the accuracy of exposure and reproduction consistency over the lifecycle of the device production process. This is done by controlling the charge state of the photo-conductive region of the projection mask, allowing for a more precise and consistent image projection. Additionally, the advanced projection optics allows for a larger scan field which helps reduce the exposure time needed for a given task, which is critical for high-volume production processes. FPA 3000 i5+ is designed with a high degree of flexibility and scalability, meaning that it can best adapt to the changing needs of the device manufacturing process. Furthermore, it is designed to run continuously with little or no downtime, while providing precise, precise, repeatable exposure on even the most densely populated surfaces. Additionally, it is highly customizable, enabling it to be adapted to almost any semiconductor production process imaginable. From wafer level to component level systems, FPA 3000I5+ is designed to provide unparalleled performance, accuracy, and speed.
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