Used CANON FPA 3000 i5+ #9065380 for sale

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Manufacturer
CANON
Model
FPA 3000 i5+
ID: 9065380
Stepper Currently deinstalled and stored in cleanroom 2001 vintage.
CANON FPA 3000 i5+ is a high-performance wafer stepper designed to provide highly efficient and precise exposure for 80 mm, 100 mm, and 200 mm wafers. It is equipped with the latest imaging optics and advanced technology to ensure reliable production of high-precision patterns. CANON FPA 3000I5+ is a notch above other wafer stepper models—dubbed the world's most advanced wafer stepper. The stepper is powered by intelligent control logic, which permits for precision pattern placement and improved system productivity. It is also equipped with a sophisticated SmartView Iris for high speed scanning and viewing capability. Additionally, its field flattening lens helps mitigate the residual image distortion when performing on large wafers, like the 200 mm wafers. FPA-3000 I5+ boasts a number of impressive features for superior accuracy in wafer pre-alignment and post-alignment exposure. Its Dual Optics System offers simultaneous exposure of two wafers, providing increased parallelization of production time. The wafer stepper also features an Ultra High Numerical Aperture (UHNA) optical design, enabling resolution down to 0.10 micrometer. This ensures precision enough for challenging circuit structures with extreme image quality. Furthermore, FPA 3000I5+ has an optional Edge Scanner that works in tandem with the Iris to automatically detect the wafer's edge while optimizing recognition accuracy Finally, this stepper has CANON-exclusive Automated Photomask Process (APP), providing complete control of post-alignment exposure. Using the APP module, users can easily insert, control, and inspect photomasks for various wafer throughput configurations. In summation, FPA 3000 i5+ is the most advanced wafer stepper currently. Its Dual Optics System, UHNA optics, and Edge Scanner offer superior accuracy and imaging capabilities, ensuring reliable production of high-precision patterns. Additionally, its APP module provides users with complete control for post-alignment exposure. By utilizing these features of CANON FPA-3000 I5+, users can expect highly efficient and precise exposure for 80 mm, 100 mm, and 200 mm wafers.
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