Used CANON FPA 3000 i5 #9068403 for sale
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ID: 9068403
Wafer Size: 6"
Vintage: 1999
Fine pattern aligner, 8"
Reticle: 6"
RtL with ACT8 1.5BL (SG 24786)
Console:
HP 715
X-terminal
Auto feeder:
A/F type: Type-VI-L
W/F size: 6" flat
Inline: Yes
Edge exposure: No
Reticle changer: 6"
Library slot no: 12
Option: PPC
Cassette type: Nikon
Wafer stage:
Flat type
Laser interferometer: Zygo 3-axis
Chuck: 6" pin
Illuminator: i-Line Hg lamp
Clean chamber:
Rasco TBW-CD-83
Image rack:
No Part No Description
1 BG4-6632 TV Image CPU PCB
2 BG4-9715 ADP-2 PCB
3 BG9-4084 ACC-1 PCB
4 BG9-4085 ACC-2 PCB
5 BG9-3501 IMP2 PCB
6 BG4-6582 HRD Processing PCB
VME rack:
No Part No Description
9 BG4-6628 CAM UNIT
10 BG3-2462 Main CPU PCB
11 SPARE
12 SPARE
13 BG4-6631 CDIF PCB
14 BG4-6629 Stage CPU PCB
15 SPARE
16 BG4-9217 DSP
17 SPARE
18 BG4-6465 Measurement PCB (X)
19 BG4-6466 Measurement PCB (Y)
20 BG4-6467 Measurement PCB (Θ)
21 SPARE
22 BG4-9175 MLE IF PCB
23 BG4-9191 XY PRE2 PCB
24 BG4-6459 OFCD IF PCB
25 BG4-9151 FZANA PCB
26 SPARE
27 BG4-7937 CCD OPTF CAP2 PCB
200V/3P/28.0KVA , 200V/1P/4.5KVA
1999 vintage.
CANON FPA 3000 i5 is a precision wafer stepper designed for high-performance lithography and advanced microfabrication. With an 800mm x 800mm field size, CANON FPA 3000I5 is an advanced optical imaging equipment capable of producing high-precision patterning of up to 80nm resolution. The system is equipped with a variety of hardware and software features, including an Installed Source Deuterium (ISDe) laser source, enhanced series mask changer, a newly designed stage amplifier and custom-developed control software. The unit also features an imaging performance of up to 4K fps and a motorized positioner (MP-1400) for precise scanning, along with a high-resolution 2MP monitor for direct viewing of the images. FPA-3000 I5 is designed for advanced lithography processes such as MEMS, semiconductor, and bio-fabrication processes. Its high-resolution imaging capabilities allow for improved accuracy and higher yields, as well as faster throughput. Its Integrated Source Deuterium (ISDe) laser source allows for a light source with a wide spectrum, providing greater depth and flexibility in lithography processes. The new series mask changer is capable of handling multiple exposure source and masks, offering greater levels of accuracy and more flexibility in the processes. CANON FPA-3000 I5 also includes enhanced motors and control algorithms for improved stage oscillations and scanning, along with a newly designed stage amplifier offering improved accuracy and faster measurement times. The machine also includes a custom-developed control software, offering flexibility and stability, as well as improved user friendliness. This ensures better results and more accurate measurements while minimizing downtime. FPA 3000 i5 is designed with a modular architecture, allowing for greater versatility and flexibility when working with different application challenges. It is equipped with an open framework, making it easier to integrate with other systems. FPA 3000I5 is the ideal tool for achieving high-resolution patterning, with maximum precision and accuracy.
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