Used CANON FPA 3000 i5+ #9258600 for sale

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CANON FPA 3000 i5+
Sold
Manufacturer
CANON
Model
FPA 3000 i5+
ID: 9258600
Wafer Size: 8"
Vintage: 2000
Stepper, 8" PC Model: EWS B180L Wafer standard: JEIDA Wafer type: Notch Reticle type: 6" Material: Quartz Changer type: HITACHI Case type: HITACHI Optical system: Magnification: 1/5 Field size: 22 mm NA: 0.63~0.45 Screen size: 6" Illumination system: Ultra-high pressure mercury lamp 2.0 kW σ: 0.7~0.3 Estimate exposure light control (4) Independent blades Wafer loader type: Notch, 8" Wafer holder type: Notch, 8" TIO2 Wafer / Reticle alignment: Clear vision field image processing Wafer alignment: Alignment light: HeNe Laser / Broad band Mode: AGA Reticle alignment: Alignment light: i-Line XY Stage: 3-Axes laser interferometer Stroke: X: 115mm ~ -115mm YX: 115mm ~ -115mm 2000 vintage.
CANON FPA 3000 i5+ wafer stepper is an advanced step and repeat equipment produced by CANON for high-end lithography operations. This system is listed as one of the top lithography systems in the lithography industry. It is a fully integrated integrated platform consisting of the basic components: i5 scanner, lens, reticle, and an imaging board. The i5 scanner is at the core of the unit. It is capable of working up to two times faster than previous standard scanners and is highly accurate. This scanner is also equipped with CANON advanced iMO (Intelligent Multi-level Optimization) technology, which provides highly reliable solutions for advanced exposure applications that require high dose uniformity and image flatness. The lens in CANON FPA 3000I5+ is a field flattening lens designed to correct aberrations in the focused image. This ensures better resolution and consistency of the images. The reticle is a nine-slice type, which is designed to reduce both ghost aberrations and improve image contrast. Lastly, the imaging board is integrated with the i5 scanner and lens machine in order to provide a stable and accurate image transfer mechanism. This imaging board is specifically designed for high-end lithography applications, ensuring that the pattern produced from the reticle remains faithful to the original design. Overall, FPA-3000 I5+ wafer stepper is an advanced step and repeat tool that provides a reliable platform for wafer lithography solutions. With its state-of-the-art components, this asset can offer users with the highest possible image fidelity and ultra-high dose uniformity. As such, this model is suitable for applications in microelectronics, optoelectronics, and other precision lithography operations.
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