Used CANON FPA 3000 i5+ #9280839 for sale
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ID: 9280839
Wafer Size: 8"
Vintage: 2000
Stepper, 8"
PC Model: EWS B180L
Wafer standard: JEIDA
Wafer type: Notch
Reticle type: 6"
Material: Quartz
Changer type: HITACHI
Case type: HITACHI
Optical system:
Magnification: 1/5
Field size: 22 mm
NA: 0.63~0.45
Screen size: 6"
Illumination system:
Light source: 2.0 kW Ultra-high pressure mercury lamp
σ: 0.7~0.3
Estimate exposure light control
Masking function: (4) Independent blades
Wafer loader type: Notch, 8"
Wafer holder type: Notch, 8" TIO2
Wafer alignment:
Alignment light: HeNe Laser / Broad band
System: Clear vision field image processing
AGA Mode
Reticle alignment:
Alignment light: i-Line
System: Clear vision field image processing
XY Stage:
System: 3-Axis laser interferometer
Stroke:
X: 115 mm ~ -115 mm
YX: 115 mm ~ -115 mm
2000 vintage.
CANON FPA 3000 i5+ is a high-speed, small-field lithography equipment designed for state-of-the-art lithography applications. The system's two-stage optics design utilizes a high-NA, large-field lens to achieve the highest resolution, smallest feature size and highest throughput for 2x or 6x reticles. This robust unit, offering a field size of 5.5 mm, is built on CANON leading-edge opto-mechanical unit design, providing reliable, stable operation and a wide exposure range. And with its advanced flight machine, alignment and measurement capabilities, the tool offers even easier maintenance and operation. CANON FPA 3000I5+ is designed to meet the most stringent requirements of the world's leading semiconductor manufacturers. It features the industry's highest-resolution projection optics, combined with advanced dose control and measurement methods, for the most demanding applications in 300mm lithography. The high-precision optics unit provides the outstanding resolution and exposure fidelity for advanced scan exposure. CANON unique asymmetric correction technology helps to optimize overlay accuracy and reduce small prey error rate. The air-bearing design offers highly precise positioning and stable operation, allowing for even greater processing reliability and yields. The advanced X-Y stage design features closed-loop positional accuracy and velocity/acceleration control. FPA-3000 I5+ also has a host of standard functions and options, including multi-frequency alignment measurements, scanning through-focus scanning, and proprietary exposure control technology. Overall, FPA 3000I5+ is an ideal asset for applications in 300mm lithography. With its robust design, high-precision optics, and advanced exposure control, it is ideal for small-field lithography, allowing you to achieve the highest resolution and throughput with the lowest total cost. The intelligent design coupled with comprehensive and reliable performance make this model an excellent choice for anyone looking for advanced technology and performance.
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