Used CANON FPA 3000 i5 #9311794 for sale

CANON FPA 3000 i5 is a world leading wafer stepper and a state-of-the-art lithography system, specifically designed for DNA nanotechnology. It is capable of imaging patterns below 100nm with <2nm overlay and up to 150nm with <5nm overlay. This powerful tool is ideal for high accuracy applications such as, photomask patterning, sub-resolution lithography, semiconductor, and data storage technologies. The i5 wafer stepper is characterized by its ultra-high resolution and dynamic range, high speed and reliability, low maintenance cost and ease-of-use. CANON FPA 3000I5 consists primarily of an illumination module, wafer stage, and a column. The illumination module provides a bright light source to the wafer, allowing for an extremely wide field of view and a large numerical aperture. The high intensity of the light source combined with the wide field of view enables the system to image features with very high accuracy. Additionally, the light source is equipped with a set of filters that enable users to change the wavelengths of light being emitted, allowing the user to control the power of the light source, the intensity, and the spectral sensitivities of the wafer that is being imaged. The wafer stage consists of a wafer holder, laser diode aligner, motion axis and a z motor. The wafer holder securely inserts and removes the wafer from the stage, while the laser diode aligner provides an optical means for rapidly and accurately aligning the wafer onto the stage. The motion axis and z motor enable the user to precisely move the wafer in any direction, effectively scanning the substrate across the field of view. The stage also has an auto-reset feature that allows for quick recall of exposure settings for various exposure processes. FPA-3000 I5 is accessible via a user-friendly graphical interface and is controlled by a powerful onboard computer. Operating parameters such as exposure times, exposure rates, and light intensity can also be adjusted, allowing users to tailor the lithography tool to specific fabrication processes or application requirements. Additionally, users can access a variety of customization options that allow the user to adjust the speed of the wafer stage and the location of the irradiated area. CANON FPA-3000 I5 is an excellent tool for photomask patterning, sub-resolution lithography, and semiconductor fabrication processes. With its high resolution, dynamic range, and efficiency, the i5 enables users to rapidly and accurately fabricate device components and components for a multitude of applications. The intuitive user interface, customizable instrument settings, and low maintenance costs make the i5 an invaluable tool for any engineer or scientist involved in the fabrication of nanotechnology components.