Used CANON FPA 3000 iW #293606922 for sale

CANON FPA 3000 iW is a state-of-the art wafer stepper designed specifically for photomask fabrication and inspection. It is equipped with a WaferStepper™, a robotic arm which controls scanning movements of the entire optical equipment. CANON FPA 3000IW utilizes advanced optics, including a nitrogen-filled Low Cross-Coherence Interferometry (LCCI) technology, for superior imaging performance and sample-to-sample uniformity. This interferometric system provides a stable background, accurate focus and optimal illumination to the sample. The unit features two light sources: an Argon-Ion laser and a Halogen lamp, and an optics package that includes a 10x microscope with an image rotation machine and an automated zooming zoom lens. FPA-3000IW also features intelligent imaging and measurement software, which enables repeatable results, automatic document generation for process validation and quick, real-time assessment of microfeatures on optical masks. This is complemented by the integrated communication interface, which provides direct connection to CAD designs and output to mask layout editors. CANON FPA 3000 I W is capable of quickly and accurately measuring ultra-small features of electron beam direct write masks, electron beam lithography masks and thin film STL masks and is compatible with the majority of standard mask layouts. Its integrated filter wheel and auto-focusing capabilities make it a robust and reliable imaging platform for advanced mask features. CANON FPA-3000 IW is an ideal workhorse for production environments, with its high throughput and sub-micron resolution combined with its ability to detect defects. With its fast imaging and processing time and easy-to-use automation capability, CANON FPA-3000IW is ideal for applications in mask-making and semiconductor production.