Used CANON FPA 3000 iW #9311331 for sale

CANON FPA 3000 iW is a wafer stepper used for highly accurate exposure and photomask production. It is an advanced tool for microlithography, utilizing a laser-scanning, laser-diode equipment to create high-resolution images on thin wafers. CANON FPA 3000IW is ideal for creating semiconductor devices and other advanced devices. FPA-3000IW offers a comprehensive set of features for advanced micromachining, with a highly precise and reliable exposure system. The stepper incorporates an advanced laser-diode, laser-scanning unit that helps create high-resolution images with minimal distortion. This laser-scanning machine is capable of scanning small, two-dimensional features with a wide variety of mask designs. The device is capable of highly precise overlay registration, allowing users to accurately register patterns on the thin wafers. FPA 3000IW produces highly optimized imaging with its advanced Iris Auto Exposure (IAE) and Dual Resolution Imaging (DRI) technology. The IAE technology allows users to correctly predict the exposure time for even very fine patterns while the DRI technology allows for higher yields by optimizing the exposure time specifically for different designs. FPA-3000 IW is equipped with Contact, Proximity, and Scanning Photolithography systems to facilitate customization of the image quality. It also supports high-speed stepper operation, facilitating high throughput in chip and wafer production. Additionally, the device features a custom-designed Objective Vision Tool, allowing for easy pattern-check and defect detection. CANON FPA 3000 I W also features various performance-enhancing functions, including Pulse Correction Asset (PCS), Adjustable Timer-Based Exposure (ATBE), and Contrast Adjustment model (CAS). PCS helps to further refine the exposure of highly fine images with multiple exposure patterns. Furthermore, ATBE allows the user to control the exposure time while the CAS equipment enables users to adjust the image quality. CANON FPA-3000IW is a highly versatile tool that can be used for a variety of applications, including advanced wafer production, circuit production, and other micromachining applications. With its advanced capabilities and features, combined with its reliable and precise exposure system, CANON FPA-3000 IW is an ideal choice for precise and reliable wafer processing.