Used CANON FPA 5000 AS2 #136492 for sale

CANON FPA 5000 AS2 is a wafer stepper (also known as an exposure tool) used in semiconductor fabrication. It is part of CANON e-Beam technology family, the leader in lithography tools for the microchip industry. FPA 5000 AS2 is a top-of-the-line tool, able to serve both prototype and production wafer needs with improved productivity and excellent image quality. CANON FPA 5000 AS2's exposure capabilities are designed for both step and repeat and continuous wafer stepper processes. Its exposure technologies include both Scanning Electron Beam (SEB) and Flying Spot exposure methods. The Flying Spot exposure method uses a static electron beam and a moving projection from the lens equipment, providing high throughput with high precision and accuracy. The exposure system on FPA 5000 AS2 is equipped with an auto-alignment unit that drastically speeds up processing times while ensuring alignment accuracy. The auto-alignment machine utilizes an auto-alignment mark detection tool that prevents misalignments of patterns that may be caused by wafer misalignment or warped wafers. CANON FPA 5000 AS2's beam position control asset provides more flexibility with its automated pattern tracking model. This equipment can track patterns and make corrections using external feedback signals. Furthermore, FPA 5000 AS2's beam monitoring and control systems are able to maintain predetermined beam parameters throughout the manufacturing process. CANON FPA 5000 AS2's large scan size and high-resolution imaging capabilities make it capable of producing images with an acceptable level of image fidelity for a broad range of wafer fabrication. Its high-resolution imaging also guarantees that images display superior contrast and sharpness. FPA 5000 AS2's low-energy wafer material vulnerability is minimized by the tool's low-energy SEB system and low SEB Chamber Voltage. The low SEB Chamber Voltage ensures that the substrate's thermally induced stress is minimized, which preserves the device specs and yields. The FPA-5000 includes a recipe archiving unit that allows customers to access and store set-up recipes. This function allows customers to customize their recipe files to better suit their needs. CANON FPA 5000 AS2 is also able to use pseudo-O2 instead of O2. Pseudo-O2 reduces the total processing times due to the elimination of intermediate steps. Additionally, FPA 5000 AS2 includes multi-level reticle exchange capability. This offers reduced cycle times due to simultaneous reticle loading and unloading. Overall, CANON FPA 5000 AS2 wafer stepper is a top-of-the-line tool for both prototype and production wafer needs. Its features provide superior image fidelity, low-energy wafer material vulnerability, increased productivity, and improved alignment accuracy.