Used CANON FPA 5000 ES2+ #9182356 for sale

CANON FPA 5000 ES2+ is a next-generation wafer stepper designed for high throughput, high accuracy, and low cost of ownership. It features a large-aperture, large-frame size optical equipment with advanced optics, lenses, and optical elements that enable cutting-edge alignment and exposure precision. The ES2+ utilizes an advanced alignment system to ensure accuracy and repeatability of batches, while the new image and mask data processing capabilities provide superior flexibility and speed of wafer production. Additionally, the ES2+ offers a variety of substrates, with on-board robotics capable of handling frames up to 850mm in size. CANON FPA-5000 ES2+ features Superior Dynamic Focus™ technology, which is designed to eliminate the need for manual focus adjustments, eliminating the possibility of operator error, while maintaining the most precise lithography focus. Further, the ES2+ has an advanced die-to-die inertial alignment and superior in-site optimization of exposure settings, allowing for more efficient patterning of complex designs. On-board data handling and quality control processes ensure that images coming out of the unit are free of defects and conform exactly to specifications. The ES2+ has a fairly intuitive user interface, with a variety of modes allowing users to fine-tune exposure settings and other parameters. Specifically, the machine allows users to make fine adjustments to global, local, or die-based settings, as well as set up lithographic parameters for specific die types, a capability not available in most other wafer steppers. Furthermore, FPA 5000 ES2+ has a number of other features that enhance throughput and accuracy. The tool offers customizable loading/unloading and substitution process settings, enabling improved production throughput and flexibility. Additionally, the asset supports expanded bits for finer resolution resolution, with pattern alignment accuracy of 40nm. Finally, the ES2+ is compatible with multiple data formats, including optical, magnetic, and electrical in order to ensure compatibility with various CAD/CAM/CAE systems. In summary, FPA-5000 ES2+ is a versatile, high-throughput wafer stepper designed to provide optimal performance and accuracy for a wide variety of substrate materials and patterns. Advanced alignment, exposure, and data processing features make the ES2+ the ideal model for production processes that require high precision in a cost-effective package.