Used CANON FPA 5000 ES2 #9200128 for sale

CANON FPA 5000 ES2 wafer stepper is a sophisticated imaging equipment. It is designed to transfer a high-resolution, high-precision pattern onto a single wafer. The stepper consists of four components: an optical source, a projection lens system, a field lens unit, and a pattern generator. The optical source houses a high-powered lamp, magnified slits and pixels, and source condensers. The projection lens machine uses multiple lenses arranged in a catadioptric tool to provide a reliable projection image. The field lens asset consists of two motorized Tilt Rotation Reciprocal Range (TRRR) stage. This stage compensates for the cylindrical distortion of the wafer surface, providing accurate pattern placement across the entire wafer. The TTLI pattern generator generates a binary pattern that is transmitted to the projection lens model. The equipment offers a maximum resolution of 0.34 µm and pattern sizes up to 22 mm x 22 mm. Coupled with the wafer stepper, CANON also provides a suite of other accessories such as field alignment and registration systems, low vibration environment systems, and automated remote operation. FPA 5000 ES2 provides the highest level of precision and accuracy available on the market. It has been used in various applications such as the fabrication of LEDs, semiconductors, and semiconductor interconnects. It is an ideal choice for both research and production laboratories.