Used CANON FPA 5000 ES2 #9273145 for sale

CANON FPA 5000 ES2 is a high-resolution wafer stepper with a 65-nm feature size resolution capability. It is an immersion type dry stepping equipment that uses an UV light source emitting in the manifold of 240nm. It enables microfabrication of transistors, capacitors, diodes, and other semiconductor components with high accuracy and speed. The system also supports overlay alignment, with an alignment accuracy of ±1.2nm, and wafer positioning precision of ±1.2nm. This unit contains a Mask Alignment Machine (MAS), a 4K CCD camera with a 564mm field of view, and a Precision Stage. The MAS has an immersion-type optical layout for high-resolution patterning with a maximum size of 519.2mm x 529.2mm. It provides optimized imaging performance and outstanding stability for high-volume production. The 4K CCD camera offers an extended dynamic range to achieve superior imaging accuracy and higher mask contrast. The 4K CCD camera has a very low noise characteristic, reducing the amount of data that needs to be stored, while providing excellent resolution. The Precision Stage provides a fast, precise, and highly reliable engineering platform for fine alignment and precise microfabrication operations. It provides the maximum resolution of 5 nm for ultra precision patterning. FPA 5000 ES2 comes with Smart Exposure Control (SEC) to ensure repeatability and achieve high throughput. It also has an adjustable layout optimization factor to enhance the ability to detect defects or errors in the mask patterning. The tool is easy to maintain and has a built-in auto-sensing asset that automates the processing of optimal exposure settings. It can be operated by multiple users simultaneously, with each user able to customize his or her settings. The machine also offers automatic trim and repair of test and production prints. It has a full color view mode and a real-time overlay mode for accurate evaluation of reticle patterns and small device components. A range of hardware and software updates are also available for improved safety, maximum usability, and the ability to handle the most advanced production challenges.