Used CANON FPA 5000 ES3 #293588073 for sale

CANON FPA 5000 ES3 is a 5 micron state-of-the-art wafer stepper equipped with a number of advanced features. Designed for the production environment, it is an ideal choice for efficient multi-project wafer processing. Its advanced optical equipment utilizes high-acuity, low distortion, diffractive optical elements and a fast stage mechanism to deliver fast and accurate alignment and measurement at a high throughput rate. CANON FPA 5000ES3 is also equipped with an advanced, auto-focus system to ensure uniform focus on a sample over any and all optical conditions, ensuring precise measurements and alignment. Its full scan line and accurate placement of pattern images offers the highest process repeatability and performance required for advanced applications. FPA-5000 ES3 incorporates a highly capable wafer mapping unit which supports both full wafer mapping as well as localized wafer mapping of critical parameters such as dose, alignment and focus. This feature allows for precise post-exposure alignment of critical structures, thereby eliminating potential yield issues due to misaligned features. FPA 5000 ES 3 also includes a powerful image annotator which allows for the rapid and accurate positioning and measurement of critical structures on a wafer. This feature is ideal for metrology and helps to speed up the fail analysis process. Additionally, CANON FPA 5000 ES 3 has a number of environmental control features such as automatic environmental monitoring and precise temperature control, which are essential for ensuring precise wafer processing conditions throughout the entire wafer fabrication process. In conclusion, FPA 5000ES3 is an advanced wafer stepper that is equipped with features and capabilities to meet the most demanding and rigorous requirements of any production environment. Its advanced optical machine and image annotation capabilities ensure precise measurements, alignment and mapping. Moreover, its comprehensive environmental control features ensure accurate and uniform process conditions throughout the entire wafer fabrication process.