Used CANON FPA 5000 ES3 #293592110 for sale

CANON FPA 5000 ES3 is a next-generation wafer stepper designed to provide superior accuracy and throughput for high volume production. CANON FPA 5000ES3 utilizes an advanced scanning pattern and precision motor control to rapidly move even the most delicate wafers across the exposure plane with minimal biasing or aberrations. The stepper allows for high magnification and large exposure fields, critical for exposing smaller, more intricate transfer masks. FPA-5000 ES3 incorporates a sophisticated control equipment that utilizes nested variable blocks to maximize throughput and maintain accuracy. The control system provides for macro exposure in both fixed pattern and variable field placement to reduce noise and generate higher yield. CANON FPA-5000 ES3 has an expanded light field for larger scans, which helps to lower defect rates. The stepper is capable of consistent autofocus handling, using non-PDF based algorithms to ensure continuous focus accuracy. FPA 5000ES3 also includes high-performance optics mounted on a precision stage that is both stable and highly repeatable in order to achieve precise alignment and exposure registration. CANON FPA 5000 ES 3 features an advanced wafer exposure unit that can achieve resolutions down to 0.25 micrometers with line widths down to 0.25 micrometers. The stepper has a 4k line-pitch exposure capability, enabling faster and more precise transfers, with an expanded viewport that helps to reduce unwanted light diffusely. FPA 5000 ES 3 utilizes an automated alignment and exposure gap adjustment to reduce false errors and improve reticle survivability. FPA 5000 ES3 has an advanced shutter machine that can withstand exposure in a high intensity light environment and is capable of precise exposure time and intensity control. The stepper is equipped with a state-of-the-art defect inspection tool that helps to identify potential defects from exposed wafers. To ensure reliability and longevity, CANON FPA 5000 ES3 is constructed from the finest materials and includes a filtration and maintenance asset to ensure optimal performance over the life cycle of the machine. The precision and advanced capabilities of CANON FPA 5000ES3 make it an essential tool for high volume and precision wafer production. With its optimized performance, superior throughput, and superior defect detection capabilities, FPA-5000 ES3 makes it possible to achieve lower levels of cycle time and costs per device with minimal waste, creating an ideal solution for advanced and cost-effective wafer processing needs.