Used CANON FPA 5000 ES3 #293609498 for sale

CANON FPA 5000 ES3
Manufacturer
CANON
Model
FPA 5000 ES3
ID: 293609498
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CANON FPA 5000 ES3 is a wafer stepper that utilizes high-precision photolithography for microfabrication. It is a modular equipment that can be customized for specific applications and it provides high yield and throughput with excellent total cost of ownership. The main components of the system are the stepper core, the main stage, the reticle stage, the exposure unit and the dryer/coater. The stepper core is composed of a microstepper platform and a liquid crystal device (LCD) microdisplay that allows the user to select and view the image. The stepper core is also equipped with a high resolution encoder to enable precise wafer alignment. The main stage has two high resolution drive axes for wafer alignment and positioning. It features an ultra-high precision air bearing structure that further increases accuracy. The main stage also has a built-in automated loader and an environmental chamber to protect the machine from environmental fluctuations. The reticle stage has two linear motors for smooth and precise movement of the reticle in X,Y and Z direction. It is equipped with a high power laser diode for optimum laser alignment. The reticle holder is designed for optimum deflection stability and eliminates reticle effects. The exposure tool is equipped with an isotropic plasma source for high speed illumination and a circular polarized illumination asset for improved image quality. It also features advanced control systems and software for wafer alignment and imaging. CANON FPA 5000ES3 also includes a dryer/coater model which uses direct pressure and vacuum to coat photoresist to the wafer. The dryer/coater equipment is temperature controlled and provides uniform coating and drying. Overall, FPA-5000 ES3 is a high precision wafer stepper that offers high yield, throughput and excellent total cost of ownership. Its modular design allows for easy customization and upgrade while its advanced control systems and software enable precise photolithography imaging and reticle alignment.
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