Used CANON FPA 5000 ES3 #9114874 for sale

CANON FPA 5000 ES3 is a wafer stepping equipment that provides precision and accuracy in the production of semiconductor integrated circuits. It is designed with a scan-and-align optical system, scanning two perpendicular distances over an entire circuit layer to precisely align its position. The unit uses an improved lens design with a 3.5-micron accuracy over 200 millimeters of active area. It also features three independent optics and illumination systems, enabling higher resolution imaging and a larger dynamic range. CANON FPA 5000ES3 includes a high-speed wafer handler that provides auto-aligning and quick wafer transition with load-in and load-out capabilities. Its motor-driven exposures of overlapping images on the wafer are done with nanometer resolution, ensuring higher uniformity and accuracy. The machine has a scanning area that ranges from 10 to 200 millimeters with the ability to handle substrates up to 200mm. Moreover, FPA-5000 ES3 utilizes a software-controlled motorized stage that is capable of achieving repeatability of +/- 0.1µm (λ/10) for z-axis movements. This feature is further complemented by its optical-alignment technology for enhanced accuracy and superior image quality. The tool boasts of a patented laser illumination asset which combines near-infrared laser scanning and white light imaging that provides superior contrast and resolution for high-precision overlay measurements. It also has a unique wafer handling model that supports both 8- and 12-inch substrates. FPA 5000 ES3 also offers advanced automation capabilities, such as the auto-alignment, auto-loading, and auto-measuring functions. Its patented laser alignment equipment allows for improved accuracy with each layer. In addition, the system comes with an opto-mechanical design that eliminates the need for a separate microscope, enabling higher throughput. FPA 5000ES3 offers a range of upgrades and accessories such as multi-dimensional auto-shift, auxiliary lenses, and high-pressure pumps for better control of particles. Its advanced diagnostic functions enable users to quickly identify problems and to take appropriate corrective measures. Its software is user-friendly, and the unit is highly reliable when handling wafer materials and substrates. It can also be used in wafer processing, microfabrication, and lithography applications.