Used CANON FPA 5000 ES3 #9123442 for sale

CANON FPA 5000 ES3 Wafer Stepper is a high-precision optical lithography machine designed to produce small, accurate electronic components. This stepper model uses an advanced scanning illumination system to optically transfer a pattern on a photomask, or reticle, onto a wafer. The machine has a long working depth of focus and feature sizes of 0.50 to 5 microns, making it perfect for creating high-density integrated circuits (ICs), micro-electromechanical systems (MEMS), and other advanced electronic components. The FPA platform offers a large working area of 450mm x 450mm and can handle substrates up to 6-inch in diameter. This advanced stepper has an improved uniformity of 4.5 microns or better and a maximum full-field irradiance of 2000 mW/cm2. In addition, it offers variable focus space from 10-30 μm with an accurate depth of focus of ±1μm and a small spot diameter of 5μm or less. It also includes a high-efficiency diffuser that minimizes photomask degradation. CANON FPA 5000ES3 Wafer Stepper was designed for usage in high-volume production environments, offering enhanced productivity and reduced cycle times. The machine features a high-speed R&D exposure mode that enables users to develop device prototypes quickly and easily. It also has a massive on-board memory that stores up to 60,000 wafer patterns and 500 reticles. This stepper model uses advanced advanced automatic alignment processes that ensure consistent and accurate lithographic results. FPA-5000 ES3 Wafer Stepper was designed for both low-cost production and ultra-high precision application, offering a balance between performance, reliability, and cost. It features a robust and reliable platform with an intuitive user interface, and comprehensive maintenance and safety functions. This stepper model also supports full automation of exposure, inspection, and measuring systems for enhanced accuracy and verification. In addition, it offers a full suite of engineering tools such as a recipe converter, parameters manager, parametric alignments, and a litho simulator.