Used CANON FPA 5000 ES3 #9200131 for sale

CANON FPA 5000 ES3 wafer stepper is a top-of-the-line, fully automated optical lithography production equipment designed to meet the demands of modern high-yield chip fabrication. Equipped with advanced imaging optics, high NA illumination, and sophisticated control systems, the ES3 can pattern even the most complex circuits onto standard substrate sizes up to 150mm (6 inches). CANON FPA 5000ES3 employs a multi-field image projection system to rapidly expose the entire wafer to its red diode laser light source. Images can be programmed and recalled from an internal library, or imported from outside. Multi-dimensional stitching algorithms ensure seamless wafer coverage. Working at up to 5 micron resolution, the ES3 can facilitate different levels of exposure from reticle to sub-reticle sizes, giving production engineers the highest level of flexibility. FPA-5000 ES3 can accurately align and position each wafer, so that complex lines and shapes can be accurately produced at any angle in relation to the edges of the wafer. With the on-board 6-axis fringe field alignment unit, processes such as cat's-eye alignment, step-and-repeat or mask pattern stitching can all be performed with great precision. The ES3 is capable of exposing wafers with different materials, and can accommodate different film formats such as positive-tone resist, negative-tone resist, direct UL lithography, on-wafer metrology, and direct ion implantation. Two wafer stages are provided for continuous processing of multiple wafers simultaneously. The fully-automated control machine of FPA 5000 ES3 is complete with diagnostic meters, monitoring systems, a mainframe computer for data storage and output, and online fault diagnostics capabilities. In addition, a network I/O tool facilitates remote operation and data collection from anywhere on the production floor. All of these features and capabilities mean that CANON FPA 5000 ES 3 can provide a maximum resolution of 5.0 microns, a large 5-inch tan window, and a perfect optics set up. In addition, the versatile control asset, robotic automation, and range of exposure formats allow the ES3 to quickly and accurately process wafers at the highest level, making it the perfect solution for high-yield chip fabrication.