Used CANON FPA 5000 ES3+ #9200132 for sale

CANON FPA 5000 ES3+ is a specialized lithography wafer stepper and computational lithography platform used in semiconductor manufacturing. It is used in cleanrooms to manufacture integrated circuits (ICs) such as microprocessors. This equipment is designed to create projection masks onto a silicon wafer surface, using an optical imaging equipment and a wafer mapping system. FPA 5000 ES3+ is equipped with a Carl Zeiss illumination unit, multiple objectives, and a total of 3 stepper magnifications. It sports an advanced wafer dispersal function coupled with a fully automated stage alignment machine to ensure precise alignment during microlithography production. The machine is also designed with state-of-the-art metrology features, allowing for high-precision overlay patterns, performance monitoring, chamber matching, defect evaluation, reticle inspection, and critical dimension (CD) metrology. CANON FPA 5000 ES3+ is equipped with a specialized data processing tool that uses advanced calculations and a unique chip-stitching pattern to generate improved pattern density. This technology can achieve a 0.63 micron resolution, while still removing potential errors in the projection mask. This is powerful for the production of integrated circuits, as it enables the accurate reproduction of nanometer-scale features. FPA 5000 ES3+ is equipped with various high-tech safety features to protect the wafer during processing. The machine is designed with built-in collision prevention protocols to reduce the possibility of human error while transferring samples. This machine is also finished with a specialized cleaning asset to ensure particulate, gas, and chemical contaminants are adequately removed from the chamber. CANON FPA 5000 ES3+ is backed by a comprehensive service package. Engineers are available to monitor and adjust various parameters of the machine. To ensure any issues are solved quickly and efficiently, the model's health can be constantly monitored, and prints out complete equipment performance reports. In sum, FPA 5000 ES3+ is an advanced lithography wafer stepper and computational lithography platform used in semiconductor manufacturing. This machine features advanced wafer alignment and metrology features, enabling it to produce integrated circuits with nanometer-scale patterns. Various safety protocols and customer service packages ensure reliable and safe production of ICs.