Used CANON FPA 5000 ES3 #9272923 for sale

CANON FPA 5000 ES3 Wafer Stepper is a state-of-the-art lithography equipment used for advanced semiconductor manufacturing. The system features a two-stage translation stage that increases throughput and allows for precise alignment of the exposure cassette. CANON FPA 5000ES3 incorporated the design features of a Massively Parallel Exposure (MPE) unit by utilizing six CANON CCD sensors and a high-resolution exposure window. The exposure window design allows for a wide variety of fabrication applications including the production of high-yield integrated chips for consumer electronics. FPA-5000 ES3 provides a maximum magnification of up to 5000x, with resolution up to 0.25um. It uses eight lens configurations, including alternate exposure optics such as convex, concave, and multi-f index lenses. Specialized illumination sources, such as point-light patterning, can also be used for design variations. The machine also features a high-sensitivity shuttering mechanism to achieve uniform exposure intensity across all shots. The tool is equipped with a world-class image processing asset, offering a wide variety of image tuning options. The software utilizes advanced technologies to adjust for lighting effects, applied photopatterns, and make other adjustments to enhance image accuracy and consistency. The software also offers an image database, allowing users to store and view patterns, recipes and any other execution settings. CANON FPA 5000 ES 3 is designed to support a range of advanced lithographic applications including deep UV, EUV and X-Ray. It is also equipped with a variety of other features including a highly efficient air-bearing stage, integrated CPU and RAM, and hardware/software compatibility with CANON advanced wafer stepper systems. This model is designed to meet the most demanding production needs, making it a powerful tool for any semiconductor manufacturer.