Used CANON FPA 5000 ES4 #293817779 for sale

CANON FPA 5000 ES4
Manufacturer
CANON
Model
FPA 5000 ES4
ID: 293817779
Stepper Numerical Aperture (NA): 0.50-0.80 Resolution: 180 nm DCO: 25 Throughput (WPH): 65-300.
CANON FPA 5000 ES4 is a fully automated wafer stepper with a state-of-the-art design, engineered for exceptional performance from wafer processing to wafer inspection. This equipment combines CANON advanced lithography and stepper technology with a modular layout to get the job done quickly and efficiently. The ES4 model has an integrated stage system with an independent pre-aligner to ensure precision. With up to 8 high-speed wafer movements per second, it enables high-throughput and can handle a variety of wafer sizes. To maximize accuracy, the unit features an innovative optical imaging architecture with advanced laser scanners. The high-precision linear stepper and feeder perfectly align wafers to the lens. This advanced wafer alignment machine also allows for in situ monitoring and adjustment of angle, focus, and position of the optics. The stepper features a clean, dust-free Optical Tool design for top-notch performance even in unfavorable environmental conditions. In addition, CANON FPA-5000 ES4 offers a high-resolution imaging asset consisting of a high dynamic range CMOS camera and a long working distance microscope. This ensures consistent results over multiple runs and environments. The stepper utilizes CANON comprehensive and user-friendly software platform offering a high degree of variability and customization. The user intuitive software facilitates experimentation, streamlining the design and production process for high-volume production runs. Achieving advanced levels of productivity, FPA-5000 ES 4 helps users to remain optimized and hit their desired throughput Project by increasing process simplicity. The model is well suited for high-precision applications that require exceptional performance and precision. With a full range of features, the ES4 is well suited for a variety of applications and processes.
There are no reviews yet