Used CANON FPA 5000 ES4 #9038993 for sale

Name: CANON FPA 5000 ES4
Brand: CANON
SKU: 9038993
Availability: SoldOut

It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.

Tap to zoom

Sold

Wafer Steppers

Manufacturer

CANON

Model

FPA 5000 ES4

ID: 9038993

KrF scanner, 8" Process: DUV, LITHO - Krf Scanner Software version: V54.06C Wafer specification: Wafer shape: SNNF (Semi notch no flat) Wafer cassette: 8" PP Miraial SMIF Interface: No System Configuration: Magnification: 1/4 NA: 0.80~0.50 Field size: 26 x 33 mm Illumination (Conventional): 0.85~0.30 (at NA=0.80) Illumination (Special): Auto selection from 4 conditions Condition sample: NA 0.80 Outer, 0.850 Inner, 0.567 (Annular) Light source: KrF (248 nm) Laser Cymer ELS-7300 30 W, 4 kHz Reticle blind setting area: Max. Field size, Min: 0.4 x 0.4 mm Reticle Alignment: Alignment sensor: Image processing method Alignment light source: 660±15 nm Reticle holder size: 6" Scan speed: 1400 mm/sec Interferrometer: 3 axis Wafer Alignment: Alignment sensor: Image processing method Alignment light source: 590±60 nm (wavelength selectable) Scan speed: 350 mm/sec Interferrometer: 5 axis Pre-alignment: Edge detection system (non-contact) Chuck maintenance: Auto chuck clean and load/unload system Inline type: Left inline Library #: 25 Reticle case type: Nikon type Particle checker: pellicle particle checker (PPC) Chemical filter type: Amine and Organic 2003 vintage.

Read More Close

CANON FPA 5000 ES4 is an advanced wafer stepper designed for use in semiconductor processing. It is an open architecture tool that offers high precision, high speed, and low cost processing for device production. The tool features a high numerical aperture (NA) objective lens with a wide angular field of view that allows for accurate patterning of device features with the highest magnification resolution available. CANON FPA-5000 ES4 stepper also offers dual imaging paths, a fast auto-focusing equipment, and a large multi-channel exposure area. FPA-5000 ES 4 is optimized to handle any wafer size, with a maximum field of view up to 7.4mm in diameter, and is capable of handling nearly any thin-film deposition process. It can also handle automotive and life sciences applications, as well as MEMS process, allowing for an extremely wide range of applications. The system is equipped with an imaging guidance unit, a highly sensitive autofocus machine, and multiple patterning technologies. It can also accommodate simultaneous multiple exposure to support precise and faithful replication. The advanced FPA 5000 ES4 stepper is designed to meet state-of-the-art requirements, with advanced features such as automated alignment, an integrated wafer transport tool, and specialized tools for precise wafer clamping and a precision stage. The cutting-edge optics and precise alignment also enable a high throughput rate and the highest resolution images available. In addition, the stepper asset is engineered to reduce both cycle time and reject rates. FPA-5000 ES4 stepper is an outstanding tool for semiconductor processing. It offers high-precision and high-speed processing at a low cost, making it the ideal choice for all types of wafer processing. It is equipped with advanced features and tools to maximize precision and efficiency, and its robust design provides worry-free operation in even the most demanding environments. Whether for device production, automotive, MEMS, or any other wafer process, CANON FPA-5000 ES 4 offers more than just cutting-edge technology; it ensures that all jobs will be handled quickly and accurately.