Used CANON FPA 5000 ES4 #9267141 for sale
It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.
Tap to zoom
Sold
ID: 9267141
Wafer Size: 12"
Vintage: 2003
Scanner, 12"
Illumination
Scan illumination
Z-Spin
Wafer type: Notch
CYMER ELS 7300 KrF Scanner laser, 248 nm
Laser
Right side console
Surface illumination (Standard): 36000 W/m²
R-Type inline direction
Reduction ratio: 1:4
Resolution: 120 nm
Alignment accuracy: 20 nm
Throughput:
AGA (8) Shots 110 wafer/hour
Step pitch: 26 nm x 33 mm
(64) Shots, 12"
Exposure amount: 300 J/m²
(3) Lighting NA:
0.80/σ0.80 Conv
0.80/σ0.40 Conv
0.80/SiB2
Projection lens NA: Variable 0.55-0.80
Exposure range (scan field): 26 x 33 mm
Wafer alignment: AGA (Off axis scope)
Reticle library: (7) Sheets
Options:
PPC Unit, 6"
Reticle barcode reader (2D), 6"
Signal tower
Relay FOUP unit
2003 vintage.
CANON FPA 5000 ES4 is a dedicated wafer stepper designed for lithography needs in device production. It is a highly accurate and reliable equipment that maximizes device consistency in the fabrication process. Using leading motion control and optics technology, CANON FPA-5000 ES4 offers advanced features, such as high-resolution imaging, parallel processing capability, and minimal thermal compression of the wafer. Together, these features provide significantly improved process stability and repeatability. FPA-5000 ES 4 stepper consists of a main body, scanner, laser diode array source, imaging optics, and an ultra-precision stage. The main body houses all the system components, and the scanner is used to create the desired pattern. The imaging optics in this unit are top-of-the-line, offering the highest resolution available. Plus, the laser diode array source provides the maximum allowable power for an 830nm exposure wavelength. To ensure accuracy, the stepper is equipped with CANON ultra-precision stage mechanism. This complex machine features two orthogonal U-axes that are driven by linear motors and provide a highly accurate positioning tool. As a result, the stage provides the best possible alignment of the pattern with the wafer, and this leads to superior process performance in terms of overlay, focusing and distortion correction. In addition, FPA-5000 ES4 stepper features a wide range of software, automation, and data acquisition tools. This allows for more efficient production and automation of the lithography process. To ensure safety, the asset integrates several conditional safety interlocks, including optical sensors, motion control, and power interlocks. FPA 5000 ES4 stepper is a reliable and advanced model designed to offer unsurpassed performance and stability for lithography needs in device production. With its top-of-the-line technology, including motion control, optics, and stage mechanisms, this equipment provides a high degree of accuracy and process control, leading to superior device consistency in production.
There are no reviews yet