Used CANON FPA 5000 iZ #9258487 for sale

CANON FPA 5000 iZ is a wafer stepper designed to achieve superior performance in a variety of advanced photolithography processes. The equipment features CANON unique high throughput imaging technology and operates at a high precision of 0.2 µm or better. It is optimized for the most advanced-level fabrication techniques, such as OPC (optical proximity correction) and Subwavelength Imaging (SWI). FPA 5000 iZ has a maximum project size of 6 inches x 6 inches, and is capable of imaging features down to 0.2 µm using a high-resolution reduction optics. The Optics packages feature high performance optics, including an anti-defocus/aberration correction system, along with metallic halide lamps for illumination adjustment. The unit is also equipped with advanced pattern cutting and stitching software which allows users to take advantage of large-field imaging and process up to four wafers at a time. CANON FPA 5000 iZ also incorporates a number of advanced systems designed to combat and minimize "marks", or image distortions, caused by the physics of the photolithography process. CANON proprietary Transmittance / Reflectance Low Angle Interference (TRLIA) machine automatically adjusts the critical exposure angles for deposited material, while CANON patent-pending Ultra High Contrast (UHC) tool enables imaging of dense, high-aspect ratio patterns with a higher rate of precision. FPA 5000 iZ is one of the top-of-the-line systems available on the lithography market. It offers users a variety of features and an enhanced level of performance and precision. The asset's advanced optics, features, and design result in high-quality imaging. In addition, the model's variance is easily adjustable, enabling users to switch between different depth of focus requirements. This allows for deliverables with a superior level of quality, accuracy and performance to meet the most demanding requirements of microfabrication.