Used CANON FPA 5500 iZ+ #9247812 for sale

CANON FPA 5500 iZ+ wafer stepper uses advanced semiconductor lithography for high throughput, high resolution imaging. Its multi-wavelength vision enables the equipment to perform complex alignment and overlay scanning when producing multiple layers. Additionally, the iZ+ features an advanced array of optical subsystems that enable pattern correction and a wide dynamic range. Its Deep Ultraviolet (DUV) scanner is capable of resolving 0.18-micron features. CANON FPA-5500IZ+ is a positional measurement system laser projection unit (LP) with an auto-focusing machine, designed for high precision, high throughput manufacturing. It is equipped with a 9 inch diameter 5-piece lens for the DUV laser, enabling the tool to reach a high image resolution and a Field of View (FOV) of 150 mm. The LP can measure through a large field of view, allowing it to be employed with precise and repeatable alignment accuracy for production and inspection of device wafers. FPA 5500 IZ++ wafer stepper has numerous features for high-precision imaging. It is equipped with a chromatic aberration corrector (CAC) for clear imaging, and a piezo-driven scanning asset that compensates for the positional drift of the CAC. Additionally, a multi-wavelength optical filter helps detect subtle differences between patterns. Furthermore, to prevent distortion, the linear pattern recognition model allows for precise alignment. It is also equipped with internal signal processing that reduces noise and enhances pattern recognition accuracy. Using a beam splitting equipment on the DUV laser, FPA-5500IZ+ can also rapidly switch between different lithography layers. This allows for quick processing time and high throughput with minimal downtime. Furthermore, the 360-degree spinner turret offers improved throughput for multiple positions. It enables the system to quickly switch overlay locations for more precise placement. CANON FPA 5500 IZ++ also offers a built-in auto-mosaic feature, allowing it to produce multi-layer, high-quality devices. This feature creates a mosaic of images to cover the substrate, without requiring a manual re-alignment of the wafer. Additionally, it is capable of handling up to 6x reticles for parallel exposure, and can image up to 8x exposures in a single job. Overall, FPA 5500 iZ+ wafer stepper is a reliable and flexible unit, providing high-precision imaging with minimized distortions, for high throughput and outputs of complex multi-layer devices. With the wide range of features it offers, it is an ideal choice for producing devices quickly and accurately.