Used CANON FPA 5500 iZ+ #9247814 for sale

CANON FPA 5500 iZ+ is a high accuracy wafer stepper ideal for advanced lithography and other semiconductor applications. It is designed to work with a wide range of wafer sizes and boasts innovative advancements in features and performance to make 2D and 3D lithography more precise and efficient. CANON FPA-5500IZ+ is equipped with a large scan stage enabling a larger field of view, and is capable of performing multiple exposure fields with resolution down to 1 nanometer per exposure point. This ensures that wafer processing does not suffer from tiling or misalignment. The machine utilizes a high accuracy synchronous Z-shift facility to ensure uniform exposure and homogeneity across wafers. The wafer stepper can also be equipped with the latest corrections to eliminate systematic errors and distortions. This includes advanced image corrections, laser autofocus, and software-based registration control to ensure precise focusing and imaging. In addition, FPA 5500 IZ++ is equipped with the latest illumination and exposure technologies, such as patented pixel limited illumination, linear polarization filter, variable angular field size and a host of other features. This ensures that prints are precisely and accurately exposed, with no image aberrations or anomalies. Furthermore, the machine incorporates advanced overlay corrections to ensure minimum levels of error in multi-layer processing. CANON FPA 5500 IZ++ is also equipped with high precision servomotors and a unique wafer tracking system and data communications module for advanced wafer transfer and throughput times. This ensures that wafer processing is fast and efficient, without causing any undue wear and tear on the machine. Finally, the wafer stepper is supported by a 24/7 service team and world-class customer support. This ensures that any problems regarding the machine are swiftly addressed. Overall, FPA-5500IZ+ is an ideal choice for serious lithographers and semiconductor manufacturers. It boasts a wide range of features designed to ensure precise and accurate wafer processing, with none of the usual problems associated with traditional lithography.