Used CANON FPA 5500 iZ #9251789 for sale

CANON FPA 5500 iZ is an immersion lithography machine developed and manufactured by CANON that is designed for precise patterning and mass production of semiconductor wafers. CANON FPA 5500IZ is an immersion lithography equipment that utilizes a high-power UV light source, advanced optics, specialized chemicals, and a scanning mechanics to expose patterns onto a wafer, creating intricate and accurate circuit patterns. FPA-5500 IZ is equipped with an advanced, binary illumination features package which enables rapid and precise patterning with high repetition and accuracy. This advanced package includes the Variable Numerical Aperture (VNA) mode which adjusts the numerical aperture and spot size to further optimize resolution characteristics and the Mask Shift Scan (MSS) which halves exposure time compared to conventional binary illumination systems. The optical setup of CANON FPA-5500 IZ is comprised of an all-reflective, catadioptric structure with a total of 10 optical elements, consisting of a shared light source, imaging lens, mirrors, focus lenses and a 4-shutter light controller. The optical elements incorporated within elevate the system's resolution to 32 nm half-pitch. FPA 5500IZ is powered by CANON proprietary CASS (Coarse Alignment and Stabilization Unit) which actively stabilizes the exposing light at the wafer plane, as well as a sub-micron level alignment capability and the CACC (Coarse Alignment and Correction Machine) which enables improved position control. Both of these features work together to create optimal and consistent results. FPA 5500 iZ is designed with a high-performance wafer stage that can control rotary motions and various scanning speeds. Its edge-exposing tool meets precise patterning requirements and its wafer loading mechanism is optimized to handle fragile wafers. CANON FPA 5500 iZ also utilizes a chemical delivery asset to ensure uniform diffusion of process chemicals for repeatable immersion lithography. CANON FPA 5500IZ is capable of patterning wafers with a size of up to 200mm and accuracy of up to 32nm half-pitch with an acceleration of 10G and a max throughput of 406wph. It is also designed with a small footprint, an environmentally friendly structure, and minimal power containment. This makes it ideal for multi-technology process development and high-volume production applications. FPA-5500 IZ is a highly advanced and versatile lithography model that is equipped with features to enable precise and efficient patterning capabilities.