Used CANON FPA 5500 iZa #293606898 for sale

Manufacturer
CANON
Model
FPA 5500 iZa
ID: 293606898
Wafer Size: 12"
Vintage: 2005
i-Line stepper, 12" Process: i-Line wide-field FOUP Load port (2) SMIF Indexers Lens performance Does not include Hard Disk Drive (HDD) Power supply: 200 VAC, 3-Phase 2005 vintage.
CANON FPA 5500 iZa is a high-end chip imaging and lithographic equipment, developed for advanced semiconductor fabrication. This wafer stepper system is engineered for advanced lithographic technology operations and precision wafer mapping capabilities. Its core features include a large optical field, and high throughput, low noise beam scanning, enabling it to deliver unparalleled image and lithography performance. CANON FPA-5500IZA is designed with a large illuminated field which is just under 20 inches and permits large die-pitch applications. This large field extends the process margin, especially when machining larger chips. The unit features a highly shock resistant and corrosion resistant design, allowing it to perform in harsh industrial process conditions. The power consumption has also been improved, providing unparalleled energy efficiency. FPA 5500IZA is equipped with high-precision, low noise beam scanning, which enables it to process small batches and for single layers, it can produce micron-accurate feature sizes. This scanning technology greatly reduces the contamination level on the wafer, providing clean processes which offer even greater precision. The machine is also equipped with a large and powerful scanning fluid lens, which gives it the ability to output up to a resolution of 0.75 micrometer, with a 20-bit color depth. CANON FPA 5500IZA employs a photoelectric lattice for fast patterning with both precise placement and precise alignment. This technology also allows for uninterrupted programming, as the tool can easily switch between small and large patterns. Additionally, the asset's high-precision alignment functions allow for precise pattern positioning and reliability. FPA-5500IZA features an advanced computer model and software, integrated with advanced algorithms, allowing it to accurately map out a high-resolution and large-field pattern on the wafer. This equipment is capable of performing advanced lithography, such as immersion lithography, and also of using advanced wafer imaging, such as advanced UV, X-ray and e-beam imaging. With its highly reliable and energy efficient design, advanced imaging and lithographic capabilities, and precise wafer mapping technology, FPA 5500 iZa provides advanced chip fabrication and lithographic operations, with unrivaled performance.
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