Used CANON FPA 5500 iZa #293606900 for sale

It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.

Manufacturer
CANON
Model
FPA 5500 iZa
ID: 293606900
Wafer Size: 12"
Vintage: 2005
i-Line stepper, 12" Process: i-Line wide-field FOUP Load port (2) SMIF Indexers Lens performance Does not include Hard Disk Drive (HDD) Power supply: 200 VAC, 3-Phase 2005 vintage.
CANON FPA 5500 iZa wafer stepper is a semiconductor lithography equipment designed to pattern extremely large wafers up to 300mm. The system features a precise advanced stage with a high-resolution encoder for the utmost accuracy and advanced unit monitoring and control for maximum throughput. The machine is suitable for sub-30nm silicon production and production at the 65nm nodes and beyond. The tool utilizes advanced heavy ion lithography to ensure top-notch pattern accuracy and overlay performance. Resolution capabilities range from 0.7nm line/space down to 15nm, while the overlay capabilities range from 1.3nm down to 15nm. The advanced heavy ion lithography helps improve productivity with higher throughput, fewer reticle changes, and fewer exposures. CANON FPA-5500IZA wafer stepper is powered by a high-performance supervisory control asset, the CORE GXP 266, which includes a WindowsCE-based operating model for maximum application flexibility and scalability. FPA 5500IZA also features an all-state-of-the-art projection optics, stage and detector systems, and a stationary 5-axis wafer handling equipment. CANON FPA-5500 IZA also features an advanced levels of purity, thermals stability and vibration reduction for highest operation performance. The Free Scanning Mode (FSM) technology further improves operation performance, allowing the wafer exposure to be scanned without the need of reinitialising the entire stepper. It also features an advanced stage technology capable of scanning up to 0.42um/sec to reduce camera exposure time and increase throughput. FPA 5500 iZa is a leader in wafer production with leading-edge lithography performance, ultra-high-resolution capability and advanced levels of reliability, accuracy and throughput. This system is ideal for producing complex devices and patterning of the most advanced 65nm and 45nm semiconductor nodes.
There are no reviews yet