Used CANON FPA 5500 iZa #9294138 for sale

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Manufacturer
CANON
Model
FPA 5500 iZa
ID: 9294138
Vintage: 2005
i-Line stepper Wavelength: 365nm SMIF Loader, 8" Parts has been changed: Qty / Parts number / Description (1) / BE2-9884 / Shading plate holder (26) / WT2-5554 / Cable ties (21) / BE8- 7401 / Insulating spaces (1) / BS0-9269 / M8 Nut (1) / BS0-9270 / M10 Nut (1) / BH6-7764 / Lamp house cable (1) / BH6-77655 / Lamp house cable (1) / BH6-7763 / Lamp house cable (2) / WA7-8266 / Battery for SMIF (1) / BM 3-9195 / IP2.1 (8) / XB6-2250-302 / Screws (2) / BS2-1164-000 / Couplings NA motor drives (5) / GH0-4056-000 / Fuse units 2005 vintage.
CANON FPA 5500 iZa is a high-end lithographic projection stepper developed by CANON. This advanced piece of optical lithography equipment is designed to expose patterned layers on wafers at resolutions as fine as 0.2 microns, which corresponds to one-fifth of the width of a hair. The FPA 5500 releases a high numerical aperture of 0.7, which enables improved focus and higher throughput when compared to conventional steppers. The FPA 5500 utilizes CANON patented advanced iZ PreAlign technology which utilizes a tilted stage, adopted from CANON scanning stepper, paired with its advanced 'VIA2' algorithm to enable precise alignment between a wafer's pattern and the stepper's exposure plane. This allows for higher alignment accuracy and improved throughput compared to conventional steppers. The FPA 5500 is powered by CANON Edge 5500 processor, featuring integrated controller ICs which reduces the size of the machine and uses 15-bit ADC/DAC and Wafer-Alignment-Machine (WAM) for advanced etching capabilities. This processor also frees up the wafer-edge zone from alignment errors when compared to obsolete wafer steppers. The precision of the FPA 5500 is further maintained by the machine's use of a high-stability glass vacuum chuck which ensures the wafer is securely held, and the projection aligner which utilizes a four-facet illuminator and stage lens configurations to minimize misalignment. The FPA 5500 also features an auto-focus system, utilizing a laser source and a focus detector to accurately gauge focal distance between the mask and wafer. Furthermore, the FPA 5500 is equipped with CANON 'Atom' Imaging Technology which increases the accuracy of the expose dose by allowing simultaneous measurement of 6 optical axes without moving. CANON FPA-5500IZA is a powerful, state-of-the-art wafer stepper. This cutting-edge optical lithography equipment enables higher alignment accuracy and improved throughput, while providing maximum precision and stability in patterning.
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