Used CANON FPA-5500iZe #293758315 for sale

CANON FPA 5500 iZe is a high-precision pattern generator for photolithography equipment suitable for production of the most advanced high-density microstructures. The equipment utilizes five-axis scanning to provide superior pattern quality and uniform edge placement at resolutions ranging from 2 μm to 32 μm. A four-dimensional, five-axis scanning control system compensates for any pattern distortions due to sway and tilt, thus providing consistently accurate patterning. The unit is configured with two separate scanners mounted on a central plate. Each scanner contains a rotating mirror that projects light through one of two objective lenses to the pattern mask and onto the wafer. This allows both high resolution and high throughput production process capabilities. The combination of two scanners also simplifies the alignment process, reducing the time and complexity of wafer preparation. In addition, the machine features an integrated high-voltage power supply providing high-temperature annealing and process optimization. Other features such as advanced automation capabilities, automated wafer loading and unloading, plus dedicated software, enables FPA 5500 iZe to be used for volume production processes. CANON FPA 5500 iZe also includes protective features to minimize risk of human damage when handling the exposed semiconductor wafers. The protective cage and easy-to-use wafer handling tool ensure that wafers can be removed from the asset without the need for protective gloves. This reduces the chance of contamination, and helps prevent wafer damage from handling. The model is designed to provide an open, user-friendly platform for users with minimal skills. The Windows-based software allows users to easily enter wafer recipes and access technical support and machine help files. In addition, an interactive diagnostics and troubleshooting equipment is provided for quick, easy determination of machine problems. Furthermore, FPA 5500 iZe contains all the necessary tools for processing of several wafer types. From optical encryption technology to attenuated phase shifting and split field imaging, the system is equipped to process and inspect the most advanced micro-patterns, features, and high-density features. It can also be used for rapid exposure and etching of advanced logic and memory products. CANON FPA 5500 iZe is an ideal tool for state-of-the-art patterning and processing of even the most challenging micro-structures. Its accuracy and flexibility make it ideal for volume production processes, and its advanced automation and integrated safety features make it a reliable tool for a variety of semiconductor applications.