Used CANON FPA 6000 AS4 #293752740 for sale
URL successfully copied!
Tap to zoom
ID: 293752740
Wafer Size: 8"
Vintage: 2004
Argon Fluoride (ArF) scanner, 8"
CYMER Laser
Reticle, 6"
Cassette: Left
SCSI Hard Disk Drive (HDD)
Wafer loader type: SCH Robot
Reticle alignment: EXA Scope unit
Chamber type: FPA-6000-ASA
CCD
Autofocus mode
Non-functional parts:
CYMER Chamber (MO / PA)
Reticle changer robot arm
Reticle pre-align stage
PC: HP B2600
2004 vintage.
CANON FPA 6000 AS4 is an advanced, automated wafer stepper equipment that uses aerial-imaging projection and high-accuracy alignment to achieve ultra-high throughput and extremely precise photolithography results. It is designed for full-range production in the semiconductor industry, including microprocessors and ICs. FPA 6000 AS4 features a highly-compact system structure, which improves throughput and reduces required space in comparison to previous models. The built-in AS4 alignment stepper and pattern simulator provide high-accuracy alignment, which enables precise alignment of the pattern position and focus in all areas of the wafer. The automated stepper is capable of recognizing the offset spots in the entire wafer with a high degree of accuracy. This increases the unit's accuracy and overall yield, especially for small pitch integrated circuits. The machine is equipped with CANON state-of-the-art CAP-activation tool, which significantly reduces the energy consumption of photolithography processes and consequently, achievable downtime. The CAP-activation is specifically designed to reduce the pre-exposure time, allowing faster throughput and higher production capacity. Furthermore, the asset is equipped with an advanced Tower Shifting Model which utilizes wafer thickness measurement information to switch the imaging optics automatically. With this equipment, CANON FPA 6000 AS4 is able to accommodate different wafer thicknesses, optimizing its imaging capabilities and printing quality. FPA 6000 AS4 is also equipped with a number of additional features to maximize throughput and improve accuracy and reliability. Its RC-registration system promotes a high level of registration between the successively produced patterns, ensuring exceptionally high pattern repeatability. In addition, the unit is equipped with a number of built-in controllers and sensors, such as wafer position sensors and AFD sensors for precise motion control. This helps ensure that the patterned wafer is imaged correctly and without defects. Finally, the machine's user-friendly controller provides operators with a fully controllable graphical user interface, which simplifies the setup and operation process. Additionally, CANON FPA 6000 AS4 provides a range of software options, enabling users to customize various parameters such as type, number, size, and resolution of patterns. This makes the tool suitable for a variety of photolithography processes, offering maximum control and flexibility during production.
There are no reviews yet