Used CANON FPA 6000 AS4 #293815419 for sale

CANON FPA 6000 AS4 is a wafer stepper that offers a small footprint and large optic lenses, making it an ideal choice for lithographic processes. This wafer stepper has a maximum lens size of 150mm at 0.40NA, and is capable of exposure on semi-spherical surfaces due to its advanced optics. FPA 6000 AS4 also features a 200mm field size and minimum laser spot size up to 0.5 microns. This equipment is equipped with various features and technologies, such as its active reticle alignment equipment, which provides the capability for better accuracy and improved overlay control using CANON proprietary reticle alignment system. CANON FPA 6000 AS4 also features CANON advanced curved field illumination unit and an aerodynamic focus machine for faster exposure times. This wafer stepper also has a large sensor numerical aperture of up to 0.90, with six independent detection areas, which make it more accurate and powerful than other wafer steppers on the market. In addition, FPA 6000 AS4 has a wide selection of exposure and scanning formats. This includes raster-based binary exposure, photomask scanning, slit scanning, and line scanning, as well as a choice of formats for each application. Furthermore, CANON FPA 6000 AS4 has an exclusive on-the-fly illumination tool that adjusts the illumination pattern based on the exposure shape. This ensures that the image is accurately homogenized for best results. All the features offered by FPA 6000 AS4 makes it an ideal choice for a variety of applications in lithographic processes.