Used CANON FPA 6000 ES5 #9227776 for sale
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ID: 9227776
Wafer Size: 12"
Vintage: 2004
KrF Scanner, 12"
248 nm
System configuration:
Type: Notch
LCP Wafer chuck
L-Type wafer thermal controller plate (WTC)
System layout:
Left type: Inline direction
TEL Lithius track interface
Auto feeder: Type X
Front side only e-console kit
Right type, 12"
Open cassette
Canon standard booth unit
(3) Color signal towers
Reticle, 6"
Reticle SMIF changer unit
Reticle barcode reader
Pellicle particle checker (Pellicle height: 5mm)
GIGAPHOTON G40K3 Excimer laser
2004 vintage.
CANON FPA 6000 ES5 is an advanced and highly accurate wafer stepper that utilizes advanced optical and mechanical components to deliver precise and repeatable results. The equipment is an advanced step and repeat integrated system that can deliver accurate and repeatable wafer processing with high yield rates. The unit can be used for a variety of different lithography processes, including single, double and multiple exposure. The wafer stepper can be utilized for a variety of different processes including photolithography, semiconductor, MEMS, and circuit board processing. The machine is built around an advanced ultra-precision scanner and imaging tool with specially-designed optical components which are capable of providing high accuracy and precision while processing even the most intricate patterns. The asset includes a special high-setup accuracy function that allows for quick setup of the model and reduces the time needed for test processing, allowing for high quality results in a fraction of the usual time. The imaging equipment includes a 4k x 4k CCD with 9 exposure gates and a high-speed linear motor which provide for a highly accurate and precise scanning pattern. The system utilizes just a single scan for process repeatability and uniformity, eliminating the need for multiple exposures and saving time, effort, and cost. The control software, which is included in the unit, provides a user friendly interface and an extensive list of features such as integrated layer management, automatic pattern optimization and wafer inspection. The machine is also able to automatically compensate errors which can occur due to environmental temperature variations. This ensures consistent results, even in difficult environmental conditions. FPA 6000 ES5 is an ideal tool for those who need high accuracy and repeatability, who work with smaller substrates, or who need to process high volumes of wafers quickly and easily. The advanced imaging and optical asset of the model provides users with an end product that quickly and easily meets the demanding requirements of many wafer processing applications.
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