Used CANON FPA 6000 ES6 #9217736 for sale
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ID: 9217736
Wafer Size: 12"
Vintage: 2004
KRF Scanner, 12"
Main (PO Module)
WS Module
RS Module
PSR
WS Chuck
Laser beam
GIGA Laser
CPSU Unit
N2 Purge
Control box
Cover panel
Wafer type: Notch
Altitude: 59 m
Wafer feeder: Right
No inline unit
No wafer temperature adjustment plate
TEL / TOKYO ELECTRON Lithius Coater / Developer
Wafer chuck, 12" LCP
Orientation flat position: Standard
Carrier unit, 12"
Booth unit: SMIF
Reticle changer: SMIF
No laser delivery optics
Excimer laser: GIGAPHOTON G41K3-1
Laser power cable unit: 20 m
Front and rear console: Cover kit
Right and left console: Attachment kit
No connector cover unit
MO Driver: Left / Right
CPSU Cable: 15 m
C-Rack power cable: 15 m
C-Rack signal cable: 15 m
No reticle cassette
No signal tower
Absolute intensity meter
No additional library
Reticle bar code reader, 6"
No cassette bar code reader
No pellicle particle checker
High-precision N° turn pa parts
No 440 test reticle
Test reticle: 756
Additional built-in console
No F47 kit
No power cable unit
No exhaust unit
Exhaust duct unit: 5 m
Axi SiA input lens
Axi zoom SiB2 input lens
Maintenance tool
No mass flow chemical filter
PO Module: WS Mount unit
Scan OPTF5+
ULEX 06S
OAS3B
Wafer interferometer
Chuck maintenance unit
Reticle interferometer
EX-A Scope
FG Unit
Illuminator
Stage reference mark
2nd Stage reference: Mark left and right
Illumination uniformity checker
Chamber
Upper control rack
Lower control rack
ALS12
Type 10 wafer feeder: PA / SH / RH
Type 10 wafer feeder: SCH / INL
Ground underground common unit
Incoherent
Manuals included
Front / Side console:
Touch screen
USB Port
Keyboard
Mouse
RS Module:
Illumination system
ZYGO 7714 R / S Side laser head
RA Main body
PRA
Reticle scan stage
PCB
PO Module:
U-Lens
OAS (OA Scope)
Scan OPTF Unit
ZYGO 7714 W / S Side laser head
Chuck maintenance unit
WS Module:
Wafer chuck type: Pin
Wafer stage
Booth 1:
J-Box left / Right
EWS
Booth 2:
Auto feeder:
Inline relay: FOUP Unit
Inline unit: WTC
Open cassette
SCH Robot
Auto feeder-PSR:
PA Unit
RCV Station
SH Hand
RH Hand
Reticle changer:
R / C Type, 6"
Cassette type: SMIF
SMIF POD
RTH Robot
Reticle stocker
Reticle stage
Barcode reader
PPC
CE Marked
Power supply: 208 V, 60 Hz
2004 vintage.
CANON FPA 6000 ES6 is a high-precision wafer stepper used in photolithography. It is a reflective scanner designed for advanced UV lithography applications in the semiconductor industry. CANON FPA-6000 ES6 provides a feature size of 0.3 µm with a numerical aperture (NA) up to 0.65, making it suitable for high-end process nodes including 28 nm and below. The stepper is capable of handling wafers of up to 8 inches, and can write exposure images in a time as short as 2.7 seconds. It comes equipped with a built-in field-emission thermal source, allowing for steadier temperature control while using low-power, thus reducing cost of ownership. The stepper features an advanced auto-alignment equipment, which allows for high levels of overlay precision and accuracy. The auto-alignment system is composed of a two-stage unit, using a light source and an image shooting machine. FPA 6000 ES6 also comes with a powerful lithography control tool that combines high-powered control algorithms with advanced optics, allowing for advanced exposure control capabilities. The control asset also includes an auto-adjustment and feedback function, which allows for optimization of imaging parameters to improve lithography stability and accuracy. The stepper can even detect and automatically adjusts exposure parameters on poorly aligned mask features, reducing expenses. FPA-6000 ES6 comes loaded with other user-friendly features, including a graphical user interface and touchscreen control panel. The stepper also has a long-life optical alignment window coat, a six-axis motion control model, high-precision optics, as well as integrated machine control for seamless integration into a production line. CANON FPA 6000 ES6 is one of the most advanced and user-friendly wafer steppers available. It is an ideal solution for high-performance lithography applications requiring precision and accuracy.
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