Used CANON FPA 6000 ES6a #9198402 for sale

CANON FPA 6000 ES6a is a wafer stepper used in the manufacture of microcircuits, photomasks, and other related products. It utilizes a large field of view (77mm x 78mm) to ensure that devices can be accurately imaged, and it has a high resolution of 0.45um for pinhole inspection. This equipment is capable of double-sided patterning and double-sided alignment, enabling multilayer devices to be fabricated efficiently. CANON FPA 6000ES6A features a comprehensive overlay accuracy with a combination of Point Alignment and Free Alignment compensations. Furthermore, wavelength scanning is engineered to optimize image enhancement. The lens used in FPA-6000ES6A is designed such that it offers supreme performance by providing a sharp imaging field with excellent contrast and minimal flare. Moreover, covering a large range of wavelengths, this lens ensures that diverse device needs are met. The ES6a is engineered for a maximum throughput of an impressive 180wspm. With built-in focusing and pattern positioning sensors as well as a Micromirror Device fitted with a high-resolution digital graphics display, CANON FPA-6000ES6A enables optimum process control. FPA 6000 ES6a is designed to provide a cost-effective alternative to the conventional double-reflection mirror system. It's equipped with an electrostatic 100kHz scan mirror, reduces vibration to increase throughput speed and reduces downtime. Additionally, the ES6a entails a Lens Cap Alignment function, which is designed to reduce the need for frequent optimizing and shortens the adjustment cycle. CANON FPA 6000 ES 6 A also has a high sensitivity photomask-to-wafer alignment system. The primary benefit provided by the alignment system is that it ensures high accuracy movement from targeted position-to-position at sub-angular accuracy. Furthermore, to ensure minimal flare, the wafer stepper implements an imported monochrome monitor for high-precision visual control. Overall, FPA 6000 ES 6 A is a highly advanced, efficient and reliable wafer stepper. Its large field of view, impressive resolution, overlay accuracy, and wide range of capabilities make it an ideal solution for the high-precision manufacture of microcircuits, photomasks and related items.